Thin film Al targets for a laser-plasma source of extreme ultraviolet radiation

Ablation and transmission of thin solid targets irradiated by intense extreme ultraviolet laser radiation

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Laser-plasma-induced extreme-ultraviolet radiation from liquid mercury.

Extreme ultraviolet (XUV) radiation from 100 to less than 30 nm is emitted from a laser-induced plasma generated on a liquid-mercury surface. This surface does not degrade even after tens of thousands of laser pulses. The 532-nm laser light focused on the mercury forms a bright plasma core and a plume extending several millimeters above the liquid level. The plasma core produces primarily conti...

Interaction of a CO2 Laser Pulse With Tin-Based Plasma for an Extreme Ultraviolet Lithography Source

The interaction of a CO2 laser pulse with Sn-based plasma for a 13.5-nm extreme ultraviolet (EUV) lithography source was investigated. It was noted that a CO2 laser with wavelength of 10.6 μm is more sensitive to surface impurities as compared with a Nd:YAG laser with wavelength of 1.06 μm. This reveals that a CO2 laser is more likely absorbed in a thinner layer near the target surface. Compare...

Laser plasma source for extreme ultraviolet lithography using a water droplet target

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

The authors present evidence of the reduction of fast ion energy from laser-produced Sn plasma by introducing a low energy prepulse. The energy of Sn ions was reduced from more than 5 keV to less than 150 eV nearly without loss of the in-band conversion from laser to 13.5 nm extreme ultraviolet EUV emission as compared with that of a single pulse. The reason may come from the interaction of the...